CO2 Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography | IntechOpen
Research activities - ARCNL
Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources | Scientific Reports
Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography
Extreme ultraviolet light from laser-produced plasma for nanolithography - MSc Projects within P&A track Advanced Matter and Energy Physics (AMEP)