6 Radiofrequency Plasma Sources for Semiconductor Processing
Numerical Analysis of Radio-Frequency Inductively Coupled Plasma Spheroidization of Titanium Metal Powder Under Single Particle and Dense Loading Conditions | SpringerLink
Utilizing Radio Frequency Plasma Treatment to Modify Polymeric Materials for Biomedical Applications | ACS Biomaterials Science & Engineering
Inductive Heating and Plasma Index
Electron Information in Single- and Dual-Frequency Capacitive Discharges at Atmospheric Pressure | Scientific Reports
Comparing low frequency (100 kHz) plasma systems to higher frequency (13.56 MHz) plasma systems - Glow Research
6 Radiofrequency Plasma Sources for Semiconductor Processing
Figure 1 from Investigation of Cold Atmospheric Pressure Plasma at Radio- frequency 13.56 MHZ | Semantic Scholar
Radiofrequency cold plasma treatment enhances seed germination and seedling growth in variety CIM-Saumya of sweet basil (Ocimum basilicum L.) - ScienceDirect
Plasma Processes and Polymers
PDF] Investigation of Ion and Electron Kinetic Phenomena in Capacitively Coupled Radio-Frequency Plasma Sheaths: A Simulation Study | Semantic Scholar